Chemically amplified resist processing with top coats for deep-ultraviolet and e-beam applications
- Karen Petrillo
- James Bucchignano
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.