Modified polyhydroxystyrenes as matrix resins for dissolution inhibition type photoresists
- G. Pawlowski
- T.P. Sauer
- et al.
- 1990
- Microlithography 1990
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.