Interfacial reaction pathways and kinetics during annealing of epitaxial Al/TiN(001) model diffusion barrier systems
- J.-S. Chun
- P. Desjardins
- et al.
- 2001
- Thin Solid Films
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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194 results for Christian Lavoie
Interfacial reactions in epitaxial Al/TiN(111) model diffusion barriers: Formation of an impervious self-limited wurtzite-structure AIN(0001) blocking layer
- J.-S. Chun
- P. Desjardins
- et al.
- 2001
- Journal of Applied Physics
Two-step codeposition process for enhanced C54-TiSi2 formation in the Ti-Si binary system
- A. Quintero
- M. Libera
- et al.
- 2001
- Journal of Applied Physics
Synchrotron x-ray diffraction and transmission electron microscopy studies of interfacial reaction paths and kinetics during annealing of fully-002-textured Al/TiN bilayers
- J.-S. Chun
- J.R.A. Carlsson
- et al.
- 2001
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Exploring thin-film reactions by means of simultaneous x-ray surface roughness and resistance measurements
- C. Lavoie
- C. Cabral Jr.
- et al.
- 2001
- Defect and Diffusion Forum
Triple-self-aligned, planar double-gate MOSFETs: Devices and circuits
- K.W. Guarini
- P. Solomon
- et al.
- 2001
- Technical Digest-International Electron Devices Meeting
In situ and ex situ measurements of stress evolution in the cobalt-silicon system
- G.A. Lucadamo
- C. Lavoie
- et al.
- 2001
- Materials Research Society Symposium - Proceedings
Detection of cobalt silicide phase formations by ultrafast optical measurements
- C. Lavoie
- C. Cabral Jr.
- et al.
- 2000
- Thin Solid Films
Silicon-induced faceting of vicinal GaAs(001)
- S. Brennan
- G.B. Stephenson
- et al.
- 2000
- Journal of Applied Physics
Dissociation of dilute immiscible copper alloy thin films
- K. Barmak
- G.A. Lucadamo
- et al.
- 2000
- Journal of Applied Physics