Source optimization for three-dimensional image designs through film stacks
- David O. S. Melville
- Alan E. Rosenbluth
- et al.
- 2009
- SPIE Advanced Lithography 2009
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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49 results for Alan E. Rosenbluth
Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process
- Kafai Lai
- Alan E. Rosenbluth
- et al.
- 2009
- SPIE Advanced Lithography 2009
Massively-parallel FDTD simulations to address mask electromagnetic effects in Hyper-NA immersion lithography
- Jaione Tirapu Azpiroz
- Geoffrey W. Burr
- et al.
- 2008
- SPIE Advanced Lithography 2008
Radiometric consistency in source specifications for lithography
- Alan E. Rosenbluth
- Jaione Tirapu Azpiroz
- et al.
- 2008
- SPIE Advanced Lithography 2008
Modeling polarization for Hyper-NA lithography tools and masks
- Kafai Lai
- Alan E. Rosenbluth
- et al.
- 2007
- SPIE Advanced Lithography 2007
Global optimization of masks, including film stack design to restore TM contrast in high NA TCC's
- Alan E. Rosenbluth
- David Melville
- et al.
- 2007
- SPIE Advanced Lithography 2007
Global optimization of the illumination distribution to maximize integrated process window
- Alan E. Rosenbluth
- Nakgeuon Seong
- 2006
- SPIE Advanced Lithography 2006
Topics in polarization ray tracing for image projectors
- Alan E. Rosenbluth
- Gregg Gallatin
- et al.
- 2005
- SPIE Optics + Photonics 2005
Assessing the impact of intrinsic birefringence on 157nm lithography
- Nakgeuon Seong
- Kafai Lai
- et al.
- 2004
- SPIE Advanced Lithography 2004
Fast calculation of images for high numerical aperture lithography
- Alan E. Rosenbluth
- Gregg Gallatin
- et al.
- 2004
- SPIE Advanced Lithography 2004