Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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37 results for L.F. Edge

Measurement of oxygen diffusion in nanometer scale HfO₂ gate dielectric films
- - Sufi Zafar
  - Hemanth Jagannathan
  - et al.
- 2011
- Applied Physics Letters
Gate capacitance reduction due to the inversion layer in high-k/metal gate stacks within a subnanometer EOT regime
- - Ryosuke Iijima
  - Lisa F. Edge
  - et al.
- 2011
- IEEE T-ED
Materials and electrical characterization of physical vapor deposited La_x Lu_1-x Oinf₃ thin films on 300 mm silicon
- - L.F. Edge
  - T. Vo
  - et al.
- 2011
- Applied Physics Letters
Stability of terbium scandate on Si(100)
- - Matt Copel
  - Nestor Bojarczuk
  - et al.
- 2010
- Applied Physics Letters
Characterization of inversion-layer capacitance of electrons in high-k/metal gate stacks
- - Ryosuke Iijima
  - Lisa F. Edge
  - et al.
- 2010
- IEEE T-ED
Determination of band offsets, chemical bonding, and microstructure of the (_Tbx_{Sc1-x) 2} O₃ /Si system
- - I. Geppert
  - M. Eizenberg
  - et al.
- 2010
- Journal of Applied Physics
Suppression of subcutaneous oxidation during the deposition of amorphous lanthanum aluminate on silicon
- - L.F. Edge
  - D.G. Schlom
  - et al.
- 2004
- Applied Physics Letters