Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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7 results for Atsuko Yamaguchi

Precise CD-SEM metrology of resist patterns at around 20 nm for 0.33NA EUV lithography
- - Nobuhiro Okai
  - Erin Lavigne
  - et al.
- 2014
- SPIE Advanced Lithography 2014
Dose-focus monitor technique using CD-SEM and application to local variation analysis
- - Shoji Hotta
  - Timothy Brunner
  - et al.
- 2012
- SPIE Advanced Lithography 2012
Spatial signature in local overlay measurements - "what CD-SEM can tell us and optical measurements can not"
- - Scott Halle
  - Daniel Moore
  - et al.
- 2010
- SPIE Advanced Lithography 2010
CD-SEM metrology of spike detection on sub-40 nm contact holes
- - Yoshinori Momonoi
  - Taro Osabe
  - et al.
- 2010
- SPIE Advanced Lithography 2010
Methodology for determining critical dimension scanning electron microscope measurement condition of sub-20 nm resist patterns for 0.33 NA extreme ultraviolet lithography
- - Nobuhiro Okai
  - Erin Lavigne
  - et al.
- 2016
- J. Micro/Nanolithogr. MEMS MOEMS
Dose-focus monitor technique using a critical-dimension scanning electron microscope and its application to local variation analysis
- - Shoji Hotta
  - Timothy Brunner
  - et al.
- 2012
- J. Micro/Nanolithogr. MEMS MOEMS
Critical dimension scanning electron microscope local overlay measurement and its application for double patterning of complex shapes
- - Shoji Hotta
  - Takumichi Sutani
  - et al.
- 2011
- J. Micro/Nanolithogr. MEMS MOEMS