Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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162 results for Cyril Cabral

Electrodeposition of Cu on Ta-based layer II: Cu Electrodeposition on Cu/Ta bilayers
- - J. Kelly
  - M. Zheng
  - et al.
- 2007
- JES
Interfacial microstructure of NiSi_x/HfO₂/SiO_x/Si gate stacks
- - M. Gribelyuk
  - C. Cabral Jr.
  - et al.
- 2007
- Thin Solid Films
Evidence for segregation of Te in Ge2 Sb2 Te5 films: Effect on the "phase-change" stress
- - L. Krusin-Elbaum
  - C. Cabral
  - et al.
- 2007
- Applied Physics Letters
Irreversible modification of Ge₂Sb₂Te₅ phase change material by nanometer-thin Ti adhesion layers in a device-compatible stack
- - C. Cabral Jr.
  - K.N. Chen
  - et al.
- 2007
- Applied Physics Letters
Alpha particle mitigation strategies to reduce chip soft error upsets
- - C. Cabral
  - K.P. Rodbell
  - et al.
- 2007
- Journal of Applied Physics
Effects of additive elements on the phase formation and morphological stability of nickel monosilicide films
- - C. Lavoie
  - C. Detavernier
  - et al.
- 2006
- Microelectronic Engineering
On the use of alloying elements for Cu interconnect applications
- - K. Barmak
  - C. Cabral
  - et al.
- 2006
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Aluminum mobility and interfacial segregation in fully silicided gate contacts
- - R.P. Pezzi
  - M. Copel
  - et al.
- 2005
- Applied Physics Letters
Interfacial segregation of dopants in fully silicided metal-oxide- semiconductor gates
- - M. Copel
  - R.P. Pezzi
  - et al.
- 2005
- Applied Physics Letters
Physical and electrical analysis of Rux Yy alloys for gate electrode applications
- - Bei Chen
  - Youseok Suh
  - et al.
- 2005
- Applied Physics Letters