Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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59 results for P. Jamison

Reversing A Decades-Long Scaling Law of Dielectric Breakdown using Hydrogen-Plasma-Treated HfO₂ ReRAM Devices
- - Ernest Y. Wu
  - Takashi Ando
  - et al.
- 2023
- Advanced Electronic Materials
A maximum extreme-value distribution model for switching conductance of oxide-RRAM in memory applications
- - Ernest Wu
  - Takashi Ando
  - et al.
- 2020
- Applied Physics Letters
SiO₂ free HfO₂ gate dielectrics by physical vapor deposition
- - P. Jamison
  - Takaaki Tsunoda
  - et al.
- 2015
- IEEE T-ED
Reduction of hafnium oxide and hafnium silicate by rhenium and platinum
- - M. Copel
  - R.P. Pezzi
  - et al.
- 2006
- Applied Physics Letters
Electron mobility dependence on annealing temperature of W/HfO ₂ gate stacks: The role of the interfacial layer
- - A.C. Callegari
  - P. Jamison
  - et al.
- 2006
- Journal of Applied Physics
Interlayer composition of HfO ₂/Si(001) films
- - M. Copel
  - M.C. Reuter
  - et al.
- 2004
- Applied Physics Letters
Thermal stability of polycrystalline silicon/metal oxide interfaces
- - A.C. Callegari
  - E. Gousev
  - et al.
- 2002
- Applied Physics Letters
Ultrathin high-K gate stacks for advanced CMOS devices
- - E. Gusev
  - D.A. Buchanan
  - et al.
- 2001
- Technical Digest - International Electron Devices Meeting
Ultrathin nitrided gate dielectrics by plasma-assisted processing
- - E. Gusev
  - D.A. Buchanan
  - et al.
- 1999
- Microelectronic Engineering