A Scaled 0.25- μm Bipolar Technology Using Full e-Beam Lithography
- John D. Cressler
- James Warnock
- et al.
- 1992
- IEEE Electron Device Letters
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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32 results for Mary Beth Rothwell
Controlling linewidth roughness in step and flash imprint lithography
- Gerard M. Schmid
- Niyaz Khusnatdinov
- et al.
- 2008
- EMLC 2008
A practical implementation of silicon microchannel coolers for high power chips
- E.G. Colgan
- B.K. Furman
- et al.
- 2005
- SEMI-THERM 2005
BEOL interconnects for 45 nm node and beyond
- R.R. Yu
- J. Doyle
- et al.
- 2005
- VMIC 2005
Looking into the crystal ball: Future device learning using hybrid E-beam and optical lithography
- S.E. Steen
- S.J. McNab
- et al.
- 2005
- Microlithography 2005
Fully-scaled 0.25-micron bipolar technology using variable shaped electron-beam lithography
- Philip J. Coane
- Kaolin G. Chiong
- et al.
- 1993
- Microlithography 1993
A-Si thin film transistors using dilute-gas plasma-enhanced chemical vapor deposition
- S.L. Wright
- M.B. Rothwell
- et al.
- 1993
- Device Research Conference 1993
Environmental radiation impact on lifetimes and quasiparticle tunneling rates of fixed-frequency transmon qubits
- R.T. Gordon
- Conal E. Murray
- et al.
- 2022
- Applied Physics Letters
Demonstration of quantum volume 64 on a superconducting quantum computing system
- Petar Jurcevic
- Ali Javadi-Abhari
- et al.
- 2021
- Quantum Science and Technology
Bulk and surface loss in superconducting transmon qubits
- Oliver E. Dial
- Doug T McClure
- et al.
- 2016
- Supercond Sci Technol