Enabling reverse tone imaging for via levels using attenuated Phase Shift Mask and source optimization
- Bassem Hamieh
- Hyun Chol Choi
- et al.
- 2013
- SPIE Advanced Lithography 2013
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.