Patterned cracks in the buried oxide layer improve yield in device release from soi wafers
- G.C. Hill
- J.I. Padovani
- et al.
- 2011
- MEMS 2011
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.