Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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84 results for Lawrence Clevenger

Activation energy for C94 and C54 TiSi₂ formation measured during rapid thermal annealing
- - E.G. Colgan
  - L. Clevenger
  - et al.
- 1994
- Applied Physics Letters
Comparison of high vacuum and ultra-high-vacuum tantalum diffusion barrier performance against copper penetration
- - L. Clevenger
  - N.A. Bojarczuk
  - et al.
- 1993
- Journal of Applied Physics
The C49 to C54-TiSi₂ transformation in self-aligned silicide applications
- - R. Mann
  - L. Clevenger
  - et al.
- 1993
- Journal of Applied Physics
Crystallization of coevaporated and ion-irradiated amorphous CoSi ₂
- - Q.Z. Hong
  - K. Barmak
  - et al.
- 1993
- Journal of Applied Physics
Electrical Resistance and Stress of Bilayer Co(P)/Cu and Ni(P)/Cu Thin Films
- - M. Paunovic
  - L. Clevenger
  - et al.
- 1993
- JES
Kinetic analysis of C49-TiSi₂ and C54-TiSi₂ formation at rapid thermal annealing rates
- - L. Clevenger
  - J.M.E. Harper
  - et al.
- 1992
- Journal of Applied Physics
The relationship between deposition conditions, the beta to alpha phase transformation, and stress relaxation in tantalum thin films
- - L. Clevenger
  - A. Mutscheller
  - et al.
- 1992
- Journal of Applied Physics
Crystallization of amorphous Co-Si alloys
- - Q.Z. Hong
  - K. Barmak
  - et al.
- 1992
- Journal of Applied Physics
Nucleation of an intermetallic at thin-film interfaces: VSi2 contrasted with Al₃Ni
- - E. Ma
  - L. Clevenger
  - et al.
- 1992
- Journal of Materials Research
Nucleation and growth during reactions in multilayer Al/Ni films: The early stage of Al₃Ni formation
- - E. Ma
  - C.V. Thompson
  - et al.
- 1991
- Journal of Applied Physics