Dependence of the Si-SiO2 barrier height on SiO2 thickness in MOS tunnel structures
- L. Kasprzak
- R.B. Laibowitz
- et al.
- 2008
- Journal of Applied Physics
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.