Selective growth of Si/SiGe resonant tunneling diodes by atmospheric pressure chemical vapor deposition
- A. Zaslavsky
- D.A. Grützmacher
- et al.
- 1992
- Applied Physics Letters
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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38 results for Y.H. Lee
Chemical sputtering of Al2O3 by fluorine-containing plasmas excited by electron cyclotron resonance
- Y.H. Lee
- Z.H. Zhou
- et al.
- 1990
- Journal of Applied Physics
Quantum fluctuations in n+ GaAs wires with invasive probes
- W. Hansen
- T.P. Smith III
- et al.
- 1990
- Surface Science
Sidewall damage in n+-GaAs quantum wires from reactive ion etching
- R. Cheung
- Y.H. Lee
- et al.
- 1989
- Applied Physics Letters
Rie-induced damage and contamination in silicon
- Young H. Lee
- G.S. Oehrlein
- et al.
- 1989
- Radiation Effects and Defects in Solids
Plasma characterization of an electron cyclotron resonance-radio-frequency hybrid plasma reactor
- Young H. Lee
- John E. Heidenreich
- et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Reactive ion etching related Si surface residues and subsurface damage: Their relationship to fundamental etching mechanisms
- Gottiieb S. Oehrlein
- Young H. Lee
- 1987
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Plasma-deposited fluorocarbon films on silicon studied by ellipsometry
- Gottlieb S. Oehrlein
- Ivar Reimanis
- et al.
- 1986
- Thin Solid Films
Summary Abstract: Reactive ion-etching-related Si surface residues and subsurface disorder
- G.S. Oehrlein
- J.G. Clabes
- et al.
- 1986
- JVSTA
Silicon near-surface disorder and etch residues caused by CCIF 3/H2 reactive ion etching
- G.S. Oehrlein
- C.M. Ransom
- et al.
- 1985
- Applied Physics Letters