Determination of proximity effect correction parameters for 0.1 μm electron-beam lithography
- Michael G. Rosenfield
- S.J. Wind
- et al.
- 1990
- Microelectronic Engineering
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13 results for W. Molzen
A Fully Scaled Submicrometer NMOS Technology Using Direct-Write E-Beam Lithography
- Matthew R. Wordeman
- April M. Schweighart
- et al.
- 1985
- IEEE T-ED
NiFe films deposited by sputter gun and applications to bubble devices
- L.J. Tao
- K.Y. Ahn
- et al.
- 1976
- Thin Solid Films