Electrical characterization of Si/Si0.7Ge0.3 quantum well wires fabricated by low damage CF4 reactive ion etching
- K.Y. Lee
- S.J. Koester
- et al.
- 1997
- Microelectronic Engineering
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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221 results at Microelectronic Engineering
Potential fluctuations due to Pb centres at the Si/SiO2 interface
- M.J. Uren
- K.M. Brunson
- et al.
- 1997
- Microelectronic Engineering
Low temperature Al-Cu planarization by PVD Al-Cu-Ge alloys (Invited lecture)
- R.V. Joshi
- 1997
- Microelectronic Engineering
A conic primitive-based pattern generator for electron-beam lithography of diffractive optical elements
- H. Rothuizen
- D. Prongué
- et al.
- 1997
- Microelectronic Engineering
Explanation for the oxide thickness dependence of breakdown characteristics of metal-oxide-semiconductor structures
- D.J. Dimaria
- 1997
- Microelectronic Engineering
Gate oxide characterization with ballistic electron emission microscopy
- R. Ludeke
- H.J. Wen
- 1997
- Microelectronic Engineering
On the relationship between stress induced leakage currents and catastrophic breakdown in ultra-thin SiO2 based dielectrics
- D.A. Buchanan
- J.H. Stathis
- et al.
- 1997
- Microelectronic Engineering
Quantitative model of the thickness dependence of breakdown in ultra-thin oxides
- 1997
- Microelectronic Engineering
An MOS transistor with Schottky source/drain contacts and a self-aligned low-resistance T-gate
- S. Rishton
- K. Ismail
- et al.
- 1997
- Microelectronic Engineering
Silicon micro/nanomechanical device fabrication based on focused ion beam surface modification and KOH etching
- J. Brugger
- G. Beljakovic
- et al.
- 1997
- Microelectronic Engineering