Reactive ion etching related Si surface residues and subsurface damage: Their relationship to fundamental etching mechanisms
- Gottiieb S. Oehrlein
- Young H. Lee
- 1987
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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357 results at Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Charge transport in magnetrons
- S.M. Rossnagel
- H.R. Kaufman
- 1987
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Radio frequency sputter deposition of si02 films at high rate
- J.S. Logar
- F. Jones
- et al.
- 1987
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Summary abstract: The low-temperature reactivity of Si(100) with NH3 and NO: Rate determining steps and rate enhancement via electronic excitations
- F. Bozso
- Ph. Avouris
- 1987
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Summary Abstract: Materials and physics issues in scaling bipolar devices
- T.H. Ningtak
- 1987
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Summary Abstract: Chernisorption of silanes on the Si(111)-(7x7) surface
- S. Gates
- B.A. Scott
- et al.
- 1987
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Summary Abstract: Transmission electron microscopy studies of the microstructure of AuNiGe ohmic contact to n-type GaAs
- Yih-Cheng Shih
- E.L. Wilkie
- et al.
- 1987
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Inverse photoemission study of the Si(100)-(2x 1) K surface
- Inder P. Batra
- J.M. Nicholls
- et al.
- 1987
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Metal induced crystallization of amorphous silicon
- P.A. Psaras
- L. Hultman
- et al.
- 1987
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Summary abstract: Theory of thin-film orientation by ion bombardment during deposition
- R. Mark Bradley
- James M.E. Harper
- et al.
- 1987
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films