Investigation of the plasma deposited silicon dioxide on hydrogenated amorphous silicon interface by capacitance measurements
- A. Gelatos
- Peter Wagner
- et al.
- 1989
- Journal of Non-Crystalline Solids
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.