193nm single layer photoresists: Defeating tradeoffs with a new class of fluoropolymers
- P.R. Varanasi
- R.W. Kwong
- et al.
- 2005
- Microlithography 2005
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1761 results for Impact Science
Silsesquioxane-based 193 nm bilayer resists: Characterization and lithographic evaluation
- Hiroshi Ito
- Hoa D. Truong
- et al.
- 2005
- Microlithography 2005
Line edge roughness reduction by plasma curing photoresists
- Arpan P. Mahorowala
- Kuang-Jung Chen
- et al.
- 2005
- Microlithography 2005
Looking into the crystal ball: Future device learning using hybrid E-beam and optical lithography
- S.E. Steen
- S.J. McNab
- et al.
- 2005
- Microlithography 2005
Perfluoropolyethers as novel materials for soft lithography
- Jason P. Rolland
- Eric C. Hagberg
- et al.
- 2005
- Microlithography 2005
The IHE-Bus: A practical tool to instrument and simulate IHE deployment
- Uri Shani
- Boaz Carmeli
- et al.
- 2005
- SPIE Medical Imaging 2005
Biological chiral recognition: The substrate's perspective
- Vidyasankar Sundaresan
- Ravinder Abrol
- 2005
- Chirality
Reactive diffusion in the Ni-Si system: Phase sequence and formation of metal-rich phases
- C. Lavoie
- C. Coia
- et al.
- 2004
- DIMAT 2004
Stress development during the reactive formation of silicide films
- Olivier Thomas
- Patrice Gergaud
- et al.
- 2004
- DIMAT 2004
Digital mammography: A world without film?
- Sharon Lloyd
- M. Jirotka
- et al.
- 2005
- Methods of Information in Medicine