Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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3 results at SPIE Photomask Technology + EUV Lithography 2007

Paving the way to a full chip gate level double patterning application
- - Henning Haffner
  - Jason Meiring
  - et al.
- 2007
- SPIE Photomask Technology + EUV Lithography 2007
Better on wafer performance and mask manufacturability of contacts with no or non-traditional serifs
- - Donald Samuels
  - Ian Stobert
- 2007
- SPIE Photomask Technology + EUV Lithography 2007
The effect of the OPC parameters on the performance of the OPC model
- - Amr Abdo
  - Ahmed Seoud
  - et al.
- 2007
- SPIE Photomask Technology + EUV Lithography 2007