The effect of OPC optical and resist model parameters on the model accuracy, run time, and stability
- Amr Abdo
- Rami Fathy
- et al.
- 2006
- SPIE Photomask Technology 2006
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2 results at SPIE Photomask Technology 2006
Mastering double exposure process window aware OPC by means of virtual targets
- Henning Haffner
- Zachary Baum
- et al.
- 2006
- SPIE Photomask Technology 2006