Zernike coefficients: Are they really enough?
- C. Progler
- Alfred K. Wong
- 2000
- SPIE Advanced Lithography 2000
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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3 results at SPIE Advanced Lithography 2000
Characterization of line width variation
- Alfred K. Wong
- Antoinette F. Molless
- et al.
- 2000
- SPIE Advanced Lithography 2000
Process window metrology
- Christopher P. Ausschnitt
- W. Chu
- et al.
- 2000
- SPIE Advanced Lithography 2000