High-aspect-ratio, ultrathick, negative-tone near-UV photoresist for MEMS applications
- M. Despont
- H. Lorenz
- et al.
- 1997
- MEMS 1997
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.