Fabrication of a full-size EUV pellicle based on silicon nitride
- Dario Goldfarb
- 2015
- SPIE Photomask Technology + EUV Lithography 2015
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This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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2 results at SPIE Photomask Technology + EUV Lithography 2015
EUV photomask defects: What prints, what doesn't, and what is required for HVM
- Jed Rankin
- Zhengqing John Qi
- et al.
- 2015
- SPIE Photomask Technology + EUV Lithography 2015