Reliability monitoring for highly leaky devices
- J.T. Ryan
- J.P. Campbell
- et al.
- 2013
- IRPS 2013
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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8 results at IRPS 2013
Characterization and optimization of charge trapping in high-k dielectrics
- Eduard Cartier
- Takashi Ando
- et al.
- 2013
- IRPS 2013
Electromigration comparison of selective CVD cobalt capping with PVD Ta(N) and CVD cobalt liners on 22nm-groundrule dual-damascene Cu interconnects
- A. Simon
- Tibor Bolom
- et al.
- 2013
- IRPS 2013
Making reliable memories in an unreliable world (invited)
- Rajiv Joshi
- Rouwaida Kanj
- et al.
- 2013
- IRPS 2013
Temperature and field interrelation study of low-k TDDB for Cu interconnects with and without liner - New insights to the roles of Cu for a competing breakdown process
- Fen Chen
- Michael Shinosky
- et al.
- 2013
- IRPS 2013
A built-in BTI monitor for long-term data collection in IBM microprocessors
- Pong-Fei Lu
- Keith A. Jenkins
- 2013
- IRPS 2013
Intrinsic dielectric stack reliability of a high performance bulk planar 20nm replacement gate high-k metal gate technology and comparison to 28nm gate first high-k metal gate process
- W. McMahon
- C. Tian
- et al.
- 2013
- IRPS 2013
A new formulation of breakdown model for high-κ/SiO2 stack dielectrics
- Ernest Y. Wu
- 2013
- IRPS 2013