Cl2-based inductively coupled plasma etching of CoFeB, CoSm, CoZr and FeMn
- K.B. Jung
- H. Cho
- et al.
- 1999
- Materials Science and Engineering B: Solid-State Materials for Advanced Technology
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2 results at Materials Science and Engineering B: Solid-State Materials for Advanced Technology
Inductively coupled plasma etching of CoFeB, CoZr, CoSm and FeMn thin films in interhalogen mixtures
- H. Cho
- K.B. Jung
- et al.
- 1999
- Materials Science and Engineering B: Solid-State Materials for Advanced Technology