Diazoquinone positive photoresist for x-ray lithography

Abstract

A new method for improving the sensitivity of x-ray resists by chemically binding iodine to the photoactive compound (PAC) has been used. It is shown that the sensitivity increases with the number of bound iodine atoms and with the proximity of the iodine atom to the diazoquinone group. The method is believed to have general implications and that it could be adopted to other types of x-ray resists for improvement of their sensitivity to x-ray radiation.