EXCIMER LASER PROJECTION LITHOGRAPHY ON A FULL-FIELD SCANNING PROJECTION SYSTEM.

Abstract

Optical projection lithography using an excimer laser light source is demonstrated on a commercial state-of-the-art full-wafer scanning 1 multiplied by projection system. Images are printed on 125-mm-diameter wafers on a Perkin-Elmer Model 500 projection printer using an XeCl laser operating at 308 nm. Near-vertical image profiles and 1- mu m resolution are experimentally demonstrated. The anamorphic optical transformation system necessary to transform the collimated, nearly rectangular excimer laser beam into the arc-shaped, effectively self-luminous illumination required by the projection system is also described.