Negative tone aqueous developable resist for photon electron and X-ray lithography

Abstract

The use of negative acting photoresists has become a integral part of device fabrication strategy. In this paper we will discuss a phenolic based photoresist which incorporates a crosslinkable resin and an acid generating sensitizer. When exposed and thermally treated, the resist forms a negative tone image which is developable in an alkaline medium. We will discuss the materials, processes and results from photon, electron and X-ray lithographic evaluations.