Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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11 results at Microlithography 1990

Resist patterning for sub-quarter-micrometer device fabrications (Invited Paper)
- - K. Chiong
  - F.J. Hohn
- 1990
- Microlithography 1990
Stepper self-metrology using automated techniques
- - T.A. Brunner
  - J.M. Lewis
  - et al.
- 1990
- Microlithography 1990
Quantitative measures for surface texture description in semiconductor wafer inspection
- - A.Ravishankar Rao
  - Ramesh Jain
- 1990
- Microlithography 1990
ALF: A facility for x-ray lithography
- - L. Grant Lesoine
  - Kenneth W. Kukkonen
  - et al.
- 1990
- Microlithography 1990
Model for focused ion beam deposition
- - J.P. Levin
  - P.G. Blauner
  - et al.
- 1990
- Microlithography 1990
Electron beam lithography, directions in direct write and mask making
- - F.J. Hohn
- 1990
- Microlithography 1990
Modified polyhydroxystyrenes as matrix resins for dissolution inhibition type photoresists
- - G. Pawlowski
  - T.P. Sauer
  - et al.
- 1990
- Microlithography 1990
A highly etch resistant, negative resist for deep-UV and electron beam lithography
- - Dennis R. McKean
  - Nicholas J. Clecak
  - et al.
- 1990
- Microlithography 1990
Negative tone aqueous developable resist for photon electron and X-ray lithography
- - Willard Conley
  - Wayne Moreau
  - et al.
- 1990
- Microlithography 1990
Silylation of poly (t-BOC) styrene resists: Performance and mechanisms
- - C.A. Spence
  - S.A. Macdonald
  - et al.
- 1990
- Microlithography 1990