Solution photochemistry of poly(dialkylsilanes): A new class of photoresists

Abstract

Polysilanes represent a new class of polymeric materials of considerable theoretical and practical interest. Although formally saturated, they absorb in the near UV and undergo rapid photodegradation. After a review of the present understanding of the electronic structure of poly(dialkylsilanes) as a function of backbone conformation, we summarize their photophysics and describe recent advances in the understanding of their solution photochemistry. © 1988 IUPAC