In-situ x-ray diffraction and resistivity analysis of CoSi2 phase formation with and without a Ti interlayer at rapid thermal annealing rates
- C. Cabral Jr.
- L. Clevenger
- et al.
- 1994
- MRS Fall Meeting 1994
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.