193 nm resists and lithography
- Roderick R. Kunz
- Robert D. Allen
- et al.
- 1994
- Polymers for Advanced Technologies
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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14 results for Roderick R. Kunz
Surface-imaged silicon polymers for 193-nm excimer laser lithography
- Patricia A. Bianconi
- David A. Smith
- et al.
- 1992
- Japanese Journal of Applied Physics
Reactive sticking coefficient of silane on the Si(111)-(7×7) Surface
- S. Gates
- C.M. Greenlief
- et al.
- 1989
- Chemical Physics Letters
Silicon hydride etch products from the reaction of atomic hydrogen with Si(100)
- Stephen M. Gates
- Roderick R. Kunz
- et al.
- 1989
- Surface Science