Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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23 results for T. Dalton

Aggressively scaled (0.143 μm ²) 6T-SRAM cell for the 32 nm node and beyond
- - D. Fried
  - J. Hergenrother
  - et al.
- 2004
- IEDM 2004
Successful dual damascene integration of extreme low k materials (k < 2.0) using a novel gap fill based integration scheme
- - S.V. Nitta
  - S. Purushothaman
  - et al.
- 2004
- IEDM 2004
Analysis of plasma-induced modification of ULK and eULK Materials: Dual damascene processing challenges for 45nm (κ ≤ 2.4) and beyond BEOL technologies
- - N. Fuller
  - M.A. Worsley
  - et al.
- 2006
- IITC 2006
Non-poisoning dual damascene patterning scheme for low-k and ultra low-k BEOL
- - W. Cote
  - D. Edelstein
  - et al.
- 2006
- ADMETA 2006
Silicon-on-insulator MOSFETs with hybrid crystal orientations
- - M. Yang
  - K.K. Chan
  - et al.
- 2006
- VLSI Technology 2006
Extendibility of PVD barrier/seed for BEOL Cu metallization
- - C.-C. Yang
  - D. Edelstein
  - et al.
- 2005
- IITC 2005
Plasma induced dielectric modification: Etching challenges for 65nm and beyond technology nodes
- - N. Fuller
  - M.A. Worsley
  - et al.
- 2005
- ISTC 2005
Electrical and reliability evaluation of Cu/Low-k integration: Exploration of PVD barrier/seed and CVD SiC(N,H) cap depositions
- - C.-C. Yang
  - D. Edelstein
  - et al.
- 2004
- ADMETA 2004
Reliability, yield, and performance of a 90 nm SOI/Cu/SiCOH technology
- - D. Edelstein
  - C.R. Davis
  - et al.
- 2004
- IITC 2004
90 nm SiCOH technology in 300 mm manufacturing
- - L. Clevenger
  - M. Yoon
  - et al.
- 2004
- ADMETA 2004