Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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5 results for Masahiro Nakamura

Advanced plasma etch for the 10nm node and beyond
- - Eric Joseph
  - Sebastian Engelmann
  - et al.
- 2013
- SPIE Advanced Lithography 2013
Nitride etching with hydrofluorocarbons III: Comparison of C₄H₉F and CH₃F for low-k′ nitride spacer etch processes
- - Hiroyuki Miyazoe
  - Nathan Marchack
  - et al.
- 2018
- JVSTB
Nitride etching with hydrofluorocarbons. II. Evaluation of C₄H₉F for tight pitch Si₃N₄ patterning applications
- - Nathan Marchack
  - Hiroyuki Miyazoe
  - et al.
- 2018
- JVSTB
Nitride etching with hydrofluorocarbons. I. Selective etching of nitride over silicon and oxide materials by gas discharge optimization and selective deposition of fluorocarbon polymer
- - Sebastian U. Engelmann
  - Robert L. Bruce
  - et al.
- 2017
- JVSTB
Challenges of tailoring surface chemistry and plasma/surface interactions to advance atomic layer etching
- - Sebastian U. Engelmann
  - Robert L. Bruce
  - et al.
- 2015
- ECS J. Solid State Sci. Technol.