Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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22 results for Joseph Angilello

Thermal stability of Si_1-xC_x/Si strained layer superlattices
- - M.S. Goorsky
  - Subramanian S. Iyer
  - et al.
- 1992
- Applied Physics Letters
Preparation And Some Properties Of Sputtered Co/U-As Multilayers
- - T.S. Plaskett
  - P. Fumagalli
  - et al.
- 1992
- IEEE Transactions on Magnetics
Epitaxy of (100) Cu on (100) Si by evaporation near room temperatures: In-plane epitaxial relation and channeling analysis
- - Chin-An Chang
  - Joyce C. Liu
  - et al.
- 1990
- Applied Physics Letters
Crystallization kinetics of amorphous NiSi_x films
- - R.D. Thompson
  - J. Angilello
  - et al.
- 1990
- Thin Solid Films
Lanthanide gallate perovskite-type substrates for epitaxial, high-T_c superconducting Ba₂YCu₃O_7-δ films
- - E.A. Giess
  - R.L. Sandstrom
  - et al.
- 1990
- IBM J. Res. Dev
Properties of diamond structure SnGe films grown by molecular beam epitaxy
- - Alex Harwit
  - P.R. Pukite
  - et al.
- 1990
- Thin Solid Films
Oriented growth of ultrathin tungsten films on sapphire substrates
- - J.H. Souk
  - Armin Segmüller
  - et al.
- 1987
- Journal of Applied Physics
Stresses and radiation damage in Ar⁺ and Ti⁺ ion-implanted silicon
- - P.B. Madakson
  - J. Angilello
- 1987
- Journal of Applied Physics
Thermal stability of Pb-alloy Josephson junction electrode materials. VII. Concentration range of single ε-phase Pb-Bi films used in counterelectrodes
- - Masanori Murakami
  - H.-C.W. Huang
  - et al.
- 1983
- Journal of Applied Physics
Tantalum silicide films deposited by dc sputtering
- - J. Angilello
  - J.E.E. Baglin
  - et al.
- 1981
- Journal of Electronic Materials