Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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2355 results at Journal of Applied Physics

Silicon etching mechanism and anisotropy in CF₄+O₂ plasma
- - Young H. Lee
  - Mao-Min Chen
- 1983
- Journal of Applied Physics
Thermal generation of confocal domains in a smectic a liquid crystal
- - N.J. Chou
  - S.W. Depp
  - et al.
- 1983
- Journal of Applied Physics
Frequency doubling in a LiNbO₃ thin film deposited on sapphire
- - G.H. Hewig
  - K. Jain
- 1983
- Journal of Applied Physics
Interaction of Pd-Er alloys with silicon
- - G. Ottaviani
  - K.N. Tu
  - et al.
- 1983
- Journal of Applied Physics
Electrical properties of amorphous tantalum pentoxide thin films on silicon
- - G.S. Oehrlein
  - A. Reisman
- 1983
- Journal of Applied Physics
Interdiffusion in copper-aluminum thin film bilayers. I. Structure and kinetics of sequential compound formation
- - H.T.G. Hentzell
  - R.D. Thompson
  - et al.
- 1983
- Journal of Applied Physics
Study of polyacetylene and composites of polyacetylene/polyethylene by electron nuclear double resonance, electron nuclear nuclear triple resonance, and electron spin echo spectroscopies
- - L. Dalton
  - H. Thomann
  - et al.
- 1983
- Journal of Applied Physics
Characterization of plasma-enhanced chemically-vapor-deposited silicon-rich silicon dioxide/thermal silicon dioxide dual dielectric systems
- - S. Yokoyama
  - D.W. Dong
  - et al.
- 1983
- Journal of Applied Physics
Band-gap narrowing from luminescence in p-type Si
- - William P. Dumke
- 1983
- Journal of Applied Physics
Hydrogen migration under avalanche injection of electrons in Si metal-oxide-semiconductor capacitors
- - R. Gale
  - F.J. Feigl
  - et al.
- 1983
- Journal of Applied Physics