Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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11 results at IRPS 2009

Comparison of electromigration behaviors of SnAg and SnCu solders
- - Minhua Lu
  - Da-Yuan Shih
  - et al.
- 2009
- IRPS 2009
TDDB failure distribution of metal gate / high-k CMOS devices on SOI substrates
- - A. Kerber
  - E. Cartier
  - et al.
- 2009
- IRPS 2009
Mapping systematic and random process variations using light emission from off-state leakage
- - Franco Stellari
  - Peilin Song
  - et al.
- 2009
- IRPS 2009
The effect of a threshold failure time and bimodal behavior on the electromigration lifetime of copper interconnects
- - R. Filippi
  - P.-C. Wang
  - et al.
- 2009
- IRPS 2009
Critical ultra low-k TDDB reliability issues for advanced CMOS technologies
- - F. Chen
  - M. Shinosky
  - et al.
- 2009
- IRPS 2009
On the contribution of line-edge roughness to intralevel TDDB lifetime in low-k dielectrics
- - J.R. Lloyd
  - X.-H. Liu
  - et al.
- 2009
- IRPS 2009
Accurate model for time-dependent dielectric breakdown of high-k metal gate stacks
- - T. Nigam
  - A. Kerber
  - et al.
- 2009
- IRPS 2009
Effects of photoinduced carrier injection on time-dependent dielectric breakdown
- - J.M. Atkin
  - R.B. Laibowitz
  - et al.
- 2009
- IRPS 2009
Stress-induced leakage current and defect generation in nFETs with HfO ₂/TiN gate stacks during positive-bias temperature stress
- - Eduard Cartier
  - Andreas Kerber
- 2009
- IRPS 2009
Impact of NBTI and PBTI in SRAM bit-cells: Relative sensitivities and guidelines for application-specific target stability/performance
- - Aditya Bansal
  - Rahul Rao
  - et al.
- 2009
- IRPS 2009