PLASMA POTENTIALS IN rf GLOW DISCHARGES.
- J.W. Coburn
- K. Koehler
- 1986
- Symposium on Plasma Processing 1986
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5 results at Symposium on Plasma Processing 1986
ELECTRICAL CHARACTERIZATION OF SILICON SURFACES EXPOSED TO RIE.
- C.M. Ransom
- P. Spirito
- 1986
- Symposium on Plasma Processing 1986
PLASMA EFFECTS ON FILM PROPERTIES OF MAGNETRON SPUTTERED CARBON FILMS.
- Michael A. Russak
- S.M. Rossnagel
- 1986
- Symposium on Plasma Processing 1986
MODEL SYSTEMS IN THE STUDY OF ETCHING MECHANISMS.
- F.R. McFeely
- J.F. Morar
- et al.
- 1986
- Symposium on Plasma Processing 1986
RADIAL DISTRIBUTION OF OXYGEN MOLECULAR IONS IN DIODE REACTOR.
- Y.H. Lee
- P.R. Brosious
- 1986
- Symposium on Plasma Processing 1986